Michael Tanksalvala

First name
Michael
Last name
Tanksalvala
Esashi Y., N.W. Jenkins, Y. Shao, J.M. Shaw, S. Park, M. Murnane, H. Kapteyn, and M. Tanksalvala, Review Of Scientific Instruments 94, (2023).
Wang B., N.J. Brooks, P. Johnsen, N.W. Jenkins, Y. Esashi, I. Binnie, M. Tanksalvala, H. Kapteyn, and M. Murnane, Optica 10, 1245 (2023).
Esashi Y., N.W. Jenkins, Y. Shao, J.M. Shaw, S. Park, M. Murnane, H. Kapteyn, and M. Tanksalvala, Review Of Scientific Instruments (In Press) (2023).
Wang B., N. Brooks, P. Johnsen, N.W. Jenkins, Y. Esashi, I. Binnie, M. Tanksalvala, H. Kapteyn, and M. Murnane, Optics & Photonics News (In Press) (2023).
Carlson D., M. Tanksalvala, D. Morrill, J. San Román, E.C. Jarque, H. Kapteyn, M. Murnane, and M. Hemmer, Optica 47, 5289-5292 (2022).
Jacobs M., Y. Esashi, N.W. Jenkins, N. Brooks, H. Kapteyn, M. Murnane, and M. Tanksalvala, Optics Express 30, 27967 (2022).
Brooks N., B. Wang, I. Binnie, M. Tanksalvala, Y. Esashi, J.L. Knobloch, Q.L. Nguyen, B. McBennett, N.W. Jenkins, G. Gui, and Z.Z.T. University, Optics Express 30, 30331 (2022).
Esashi Y., M. Tanksalvala, Z. Zhang, N.W. Jenkins, H. Kapteyn, and M. Murnane, Osa Continuum 4, 1497 (2021).
Wang B., M. Tanksalvala, Z. Zhang, Y. Esashi, N.W. Jenkins, M. Murnane, H. Kapteyn, and C.-T. Liao, Metrology, Inspection, And Process Control For Semiconductor Manufacturing Xxxv 11611, 76-90 (2021).
Tanksalvala M., C.L. Porter, Y. Esashi, B. Wang, N.W. Jenkins, Z. Zhang, G.P. Miley, J.L. Knobloch, B. McBennett, N. Horiguchi, and S. Yazdi, Science Advances 7, eabd9667 (2021).