Ion-enhanced etching of Si(100) with molecular chlorine: Reaction mechanisms and product yields
Author | |
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Year of Publication |
1999
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Date Published |
Jan-01-1999
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Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
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Volume |
17
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Start Page or Article ID |
3340
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ISSN Number |
07342101
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DOI | |
Download citation | |
JILA PI | |
Journal Article
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Publication Status |