Laser single-photon ionization mass spectrometry measurements of SiCl and SiCl2 during thermal etching of Si(100)
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Year of Publication |
1997
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Date Published |
Jan-07-1997
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Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
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Volume |
15
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Start Page or Article ID |
2134
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ISSN Number |
07342101
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DOI | |
Download citation | |
JILA PI | |
Journal Article
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Publication Status |