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Activation of the Si(100)/Cl2 Etching Reaction at High Cl2 Translational Energies
Author
F. Campos
G. Weaver
C. Waltman
Stephen Leone
Year of Publication
1991
Date Published
Jan-01-1991
Journal Title
MRS Proceedings
Volume
236
Start Page or Article ID
177-182
DOI
10.1557/PROC-236-177
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JILA PI
Stephen Leone
Journal Article
Publication Status
Published