A hyperthermal (0.1\textendash4 eV) F atom beam source suitable for surface etching investigations
Author | |
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Year of Publication |
1990
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Date Published |
Jan-07-1990
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Journal Title |
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films
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Volume |
8
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Start Page or Article ID |
3118
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ISSN Number |
07342101
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DOI | |
Download citation | |
JILA PI | |
Journal Article
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Publication Status |