Temperature dependence of neutral and positively charged Si and SiCl etch products during argon-ion-enhanced etching of Si(100) by Cl2
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Year of Publication |
2000
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Date Published |
Jan-01-2000
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Journal Title |
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures
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Volume |
18
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Start Page or Article ID |
191
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ISSN Number |
0734211X
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DOI | |
Download citation | |
JILA PI | |
Journal Article
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Publication Status |