Ion-Enhanced Etching of Si(100) with Molecular Chlorine:~ Neutral and Ionic Product Yields as a Function of Ion Kinetic Energy and Molecular Chlorine Flux
Author | |
---|---|
Year of Publication |
2000
|
Date Published |
Jan-04-2000
|
Journal Title |
The Journal of Physical Chemistry B
|
Volume |
104
|
Start Page or Article ID |
3261-3266
|
ISSN Number |
1520-6106
|
DOI | |
Download citation | |
JILA PI | |
Journal Article
|
|
Publication Status |