Abstract:
Future electronic and quantum devices will require near-atomically-precise nanofabrication processes, but present plasma processing methods create a variety of imperfections that limit device performance. In this talk, I will present atomic layer etching processing for materials including superconducting titanium nitride, lithium niobate, and compound semiconductors which enable etching with Angstrom-scale precision. I will also describe our efforts to validate the process improvements at the device level.
Bio:
Austin Minnich is Deputy Chair of the Division of Engineering and Applied Science and a Professor of Mechanical Engineering and Applied Physics at the California Institute of Technology. He received his Bachelor’s degree from UC Berkeley in 2006 and his PhD from MIT in 2011, after which he started his position at Caltech. He is the recipient of a 2013 NSF CAREER Award, a 2015 ONR Young Investigator Award, a 2017 Director of Research Award from the Navy, the 2017 Junior Prize from the International Photothermal and Photoacoustics Association, the 2017 Bergles-Rohsenow Young Investigator Award, and a 2019 Presidential Early Career Award for Scientists and Engineers (PECASE).