@article{13350,
  keywords = {Instrumentation},
  author = {Yuka Esashi and Nicholas Jenkins and Yunzhe Shao and Justin Shaw and Seungbeom Park and Margaret Murnane and Henry Kapteyn and Michael Tanksalvala},
  title = {Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging},
  abstract = {<jats:p>Imaging using coherent extreme-ultraviolet (EUV) light provides exceptional capabilities for the characterization of the composition and geometry of nanostructures by probing with high spatial resolution and elemental specificity. We present a multi-modal tabletop EUV imaging reflectometer for high-fidelity metrology of nanostructures. The reflectometer is capable of measurements in three distinct modes: intensity reflectometry, scatterometry, and imaging reflectometry, where each mode addresses different nanostructure characterization challenges. We demonstrate the system’s unique ability to quantitatively and non-destructively measure the geometry and composition of nanostructures with tens of square microns field of view and sub-nanometer precision. Parameters such as surface and line edge roughness, density, nanostructure linewidth, and profile, as well as depth-resolved composition, can be quantitatively determined. The results highlight the applicability of EUV metrology to address a wide range of semiconductor and materials science challenges.</jats:p>},
  year = {2023},
  journal = {Review of Scientific Instruments},
  volume = {94},
  publisher = {AIP Publishing},
  issn = {0034-6748, 1089-7623},
  doi = {10.1063/5.0175860},
}