@proceedings{12339,
  author = {Fabian Holzmeier and Kevin Dorney and Esben Larsen and Thomas Nuytten and Dhirendra Singh and Michiel van Setten and Pieter Vanelderen and Clayton Bargsten and Seth Cousin and Daisy Raymondson and Eric Rinard and Rod Ward and Henry Kapteyn and Stefan Böttcher and Oleksiy Dyachenko and Raimund Kremzow and Marko Wietstruk and Geoffrey Pourtois and Paul van der Heide and John Petersen},
  editor = {Eric Panning and Alexander Liddle},
  title = {Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography},
  abstract = {Imec’s AttoLab is the first industrial laboratory capable of watching the ultrafast dynamics of photoresists following 13.5 nm, EUV exposure, and for emulating high-numerical-aperture (high-NA) exposure on 300-mm wafers using two-beam EUV interference. The two respective beamlines are powered by a laser-based high-harmonic generation EUV source. Its capabilities have recently been proven by imaging 20 nm pitch lines and spaces using Lloyd’s Mirror interference lithography. In parallel, time-averaged and time-resolved techniques for studying the ultrafast dynamics of photoresists after EUV exposure, coherent diffractive imaging to study resist interfaces, and more sophisticated interference lithography techniques for printing sub-22 nm pitches on full 300-mm wafers are being developed. Taking advantage of the bright and short EUV pulses now available at imec, we will be able to contribute to a smooth transition towards next generation high-NA lithography.},
  year = {2021},
  journal = {Novel Patterning Technologies 2021},
  volume = {11610},
  pages = {1161010},
  month = {2021-02},
  publisher = {SPIE},
  isbn = {9781510640535},
  doi = {10.1117/12.2595038},
}